Development of positive electron-beam chemical amplification resists using tetrahydropyranyl-protected polyvinylphenol.

Chemical Amplification Resists for Future Lithography

The technologies for future lithography have been proposed, such as i-line phase-shifting lithography, deep-UV lithography and electron beam lithography. We have proposed several types of chemical amplification resist systems for future lithography. These are based on the change in dissolution rate by acid catalyzed reaction for aqueous development: dissolution inhibitor to dissolution promoter...

Development of Inorganic Resists for Electron Beam Lithography: Novel Materials and Simulations

Electron Beam Lithography of Fresnel Zone Plates Using A Rectilinear Machine And Trilayer Resists

We describe the use of a commercial e-beam lithography system (JEOL JBX-6000FS) to fabricate Fresnel zone plates for x-ray microscopy. The machine is capable of controlling the pitch of optical gratings with sub-nanometer precision, so its beam placement properties are more than adequate for zone plate fabrication. The zone plate pattern is written into a thin top layer (PMMA or Calixarene) of ...

Measurements of Photon Beam Flattening Filter Using an Anisotropic Analytical Algorithm and Electron Beam Employing Electron Monte Carlo

  Introduction: This study aimed to report the measurement of photon and electron beams to configure the Analytical Anisotropic Algorithm and Electron Monte Carlo used in clinical treatment. Material and Methods: All measurements were performed in a large water phantom using a 3-dimensional scanning system (PTW, Germany). ...

Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process

A HSQ/PMMA bilayer resist system, in which HSQ as negative tone electron beam resist top layer and PMMA as bottom layer, has been investigated for negative tone lift-off process. Patterns are first defined on the HSQ resist using electron beam lithography, and then transferred into the bottom PMMA layer using oxygen reactive ion etching. Electron beam exposure of HSQ on top of PMMA layer has be...